Adisyn says it has made a low-temperature graphene layer for semiconductor interconnects

Adisyn said on April 20, 2026, that it had demonstrated a continuous graphene layer on a 1-centimeter coupon using industrial atomic layer deposition equipment, a result the company says is designed to fit semiconductor manufacturing limits rather than force a new process flow.

By |2026-04-26T04:15:53+00:00April 26th, 2026|News|

Adisyn Says Low-Temperature Graphene Film Could Open a Semiconductor Path Beyond Copper Interconnects

Adisyn said on April 20, 2026, that it had demonstrated continuous graphene formation on a 1-centimeter coupon using an industrial atomic layer deposition system at temperatures below 450C, a milestone it says could help address copper interconnect limits in advanced chips.

By |2026-04-24T02:46:04+00:00April 24th, 2026|News|
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