Adisyn says it has made a low-temperature graphene layer for semiconductor interconnects

Adisyn said on April 20, 2026, that it had demonstrated a continuous graphene layer on a 1-centimeter coupon using industrial atomic layer deposition equipment, a result the company says is designed to fit semiconductor manufacturing limits rather than force a new process flow.

By |2026-04-26T04:15:53+00:00April 26th, 2026|News|
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